<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:creator>Sevim, Semih</dc:creator>
  <dc:creator>Franco, Carlos</dc:creator>
  <dc:creator>Liu, Hongjun</dc:creator>
  <dc:creator>Roussel, Hervé</dc:creator>
  <dc:creator>Rapenne, Laetitia</dc:creator>
  <dc:creator>Rubio‐Zuazo, Juan</dc:creator>
  <dc:creator>Chen, Xiang‐Zhong</dc:creator>
  <dc:creator>Pané, Salvador</dc:creator>
  <dc:creator>Muñoz‐Rojas, David</dc:creator>
  <dc:creator>deMello, Andrew J.</dc:creator>
  <dc:creator>Puigmartí‐Luis, Josep</dc:creator>
  <dc:date>2019</dc:date>
  <dc:identifier>https://sonar.ch/global/documents/262149</dc:identifier>
  <dc:language>eng</dc:language>
  <dc:relation>info:eu-repo/semantics/altIdentifier/doi/10.1002/admt.201800666</dc:relation>
  <dc:relation>info:eu-repo/semantics/altIdentifier/issn/2365-709X</dc:relation>
  <dc:source>Advanced Materials Technologies. - Wiley. - 2019, vol. 4, no. 6, p. 1800666</dc:source>
  <dc:title xmlns:ns0="xml" ns0:lang="en">In‐Flow MOF Lithography</dc:title>
  <dc:type>http://purl.org/coar/resource_type/c_6501</dc:type>
</oai_dc:dc>