Fabrication of low aspect ratio three-element Boersch phase shifters for voltage-controlled three electron beam interference
Journal article

Fabrication of low aspect ratio three-element Boersch phase shifters for voltage-controlled three electron beam interference

  • Thakkar, Pooja ORCID Swiss Nanoscience Institute, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
  • Guzenko, Vitaliy A. ORCID Photon Science Division, Paul Scherrer Institut, Forschungsstrasse 111, 5232 Villigen PSI, Switzerland
  • Lu, Peng-Han RWTH Aachen University, Ahornstraße 55, 52074 Aachen, Germany
  • Dunin-Borkowski, Rafal E. Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons and Peter Grünberg Institute, Forchungszentrum Jülich, Wilhelm-Johnen-Strasse, 52425 Jülich, Germany
  • Abrahams, Jan Pieter ORCID Biozentrum, University of Basel, Klingelbergstrasse 70, 4056 Basel, Switzerland
  • Tsujino, Soichiro ORCID Swiss Nanoscience Institute, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
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Published in:
  • Journal of Applied Physics. - AIP Publishing. - 2020, vol. 128, no. 13, p. 134502
Language
  • English
Open access status
closed
Identifiers
Persistent URL
https://sonar.ch/global/documents/11378
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