Chemical vapour deposition of freestanding sub-60 nm graphene gyroids
-
Cebo, Tomasz
Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
-
Aria, Adrianus I.
ORCID
Surface Engineering and Nanotechnology Institute, Cranfield University, Cranfield MK43 0AL, United Kingdom
-
Dolan, James A.
Adolphe Merkle Institute, University of Fribourg, Fribourg CH-1700, Switzerland
-
Weatherup, Robert S.
Department of Chemistry, University of Cambridge, Cambridge, CB2 1EW, United Kingdom
-
Nakanishi, Kenichi
Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
-
Kidambi, Piran R.
Department of Chemical and Biomolecular Engineering, Vanderbilt University School of Engineering, 2301 Vanderbilt Place PMB 351826, Nashville, Tennessee 37235-1826, USA
-
Divitini, Giorgio
Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, United Kingdom
-
Ducati, Caterina
Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, United Kingdom
-
Steiner, Ullrich
Adolphe Merkle Institute, University of Fribourg, Fribourg CH-1700, Switzerland
-
Hofmann, Stephan
ORCID
Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
Show more…
Published in:
- Applied Physics Letters. - AIP Publishing. - 2017, vol. 111, no. 25, p. 253103
-
Language
-
-
Open access status
-
green
-
Identifiers
-
-
Persistent URL
-
https://sonar.ch/global/documents/117317
Statistics
Document views: 44
File downloads: