Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN
- Rajendran, Rajeev Paul Scherrer Institut (Switzerland)
- Mochi, Iacopo Paul Scherrer Institut (Switzerland)
- Helfenstein, Patrick Paul Scherrer Institut (Switzerland)
- Mohacsi, Istvan Paul Scherrer Institut (Switzerland)
- Redford, Sophie Paul Scherrer Institut (Switzerland)
- Mozzanica, Aldo Paul Scherrer Institut (Switzerland)
- Schmitt, Bernd Paul Scherrer Institut (Switzerland)
- Yoshitake, Shushuke NuFlare Technology, Inc. (Japan)
- Ekinci, Yasin Paul Scherrer Institut (Switzerland)
Published in:
- Metrology, Inspection, and Process Control for Microlithography XXXI. - SPIE. - 2017
- Language
-
- English
- Open access status
- green
- Identifiers
- Persistent URL
- https://sonar.ch/global/documents/139497
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