Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Del Re, Ryan College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States
Passarelli, James College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States
Sortland, Miriam College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States
Cardineau, Brian College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States
Ekinci, Yasin Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
Buitrago, Elizabeth Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
Neisser, Mark Sematech, Albany, New York 12203, United States
Freedman, Daniel A. State University of New York at New Paltz, 1 Hawk Drive, New Paltz, New York 12561, United States
Brainard, Robert L. College of Nanoscale Science and Engineering, 257 Fuller Road, Albany, New York 12203, United States

Published in:

Journal of Micro/Nanolithography, MEMS, and MOEMS. - SPIE-Intl Soc Optical Eng. - 2015, vol. 14, no. 4, p. 043506

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closed

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https://sonar.ch/global/documents/139693

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