Journal article

Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

Show more…
Published in:
  • Extreme Ultraviolet (EUV) Lithography VIII. - SPIE. - 2017
Language
  • English
Open access status
green
Identifiers
Persistent URL
https://sonar.ch/global/documents/196997
Statistics

Document views: 16 File downloads:
  • fulltext.pdf: 0