Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review.
- Romano L Institute for Biomedical Engineering, ETH Zürich, 8092 Zürich, Switzerland.
- Stampanoni M Institute for Biomedical Engineering, ETH Zürich, 8092 Zürich, Switzerland.
- 2020-06-18
Published in:
- Micromachines. - 2020
English
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication.
- Language
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- English
- Open access status
- gold
- Identifiers
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- DOI 10.3390/mi11060589
- PMID 32545633
- Persistent URL
- https://sonar.ch/global/documents/221665
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