Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering
- Eren, Baran Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
- Fu, Wangyang Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
- Marot, Laurent Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
- Calame, Michel Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
- Steiner, Roland Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
- Meyer, Ernst Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland
Published in:
- Applied Physics Letters. - AIP Publishing. - 2015, vol. 106, no. 1, p. 011904
- Language
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- English
- Open access status
- green
- Identifiers
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- DOI 10.1063/1.4905597
- ISSN 0003-6951
- Persistent URL
- https://sonar.ch/global/documents/231910
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