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E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces
Journal article

E. coli Inactivation by High-Power Impulse Magnetron Sputtered (HIPIMS) Cu Surfaces

  • Kusiak-Nejman, E. West Pomerianian University of Technology, Szczecin, Institute of Chemical and Environment Engineering, Pulaskiego 10, 70-322 Szczecin, Poland
  • Morawski, A.W. West Pomerianian University of Technology, Szczecin, Institute of Chemical and Environment Engineering, Pulaskiego 10, 70-322 Szczecin, Poland
  • Ehiasarian, A. P. Material and Engineering Research Institute, Sheffield Hallam University, Howard St. Sheffield, S1 1WB, U.K.
  • Pulgarin, C. Group of Electrochemical Engineering, EPFL-SB-ISIC-GGEC, Station 6, CH-1015, Lausanne, Switzerland
  • Baghriche, O. Group of Electrochemical Engineering, EPFL-SB-ISIC-GGEC, Station 6, CH-1015, Lausanne, Switzerland
  • Mielczarski, E. INPL/ENG, CNRS, UMR7569, Pole de l’Eau, BP 40,15 Av du Charmois 54501Vandoeuvre-les-Nancy, Cedex, France
  • Mielczarski, J. INPL/ENG, CNRS, UMR7569, Pole de l’Eau, BP 40,15 Av du Charmois 54501Vandoeuvre-les-Nancy, Cedex, France
  • Kulik, A. EPFL SB IPSB LPMV BSP 417, Bât. sciences physiques UNIL, CH-1015, Lausanne Switzerland
  • Kiwi, J. Laboratory of Photonics and Interfaces, EPFL-SB-ISIC-LPI, Chemistry Building, Station 6, CH-1015, Lausanne, Switzerland
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  • 2011-10-6
Published in:
  • The Journal of Physical Chemistry C. - American Chemical Society (ACS). - 2011, vol. 115, no. 43, p. 21113-21119
Language
  • English
Open access status
closed
Identifiers
Persistent URL
https://sonar.ch/global/documents/25555
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