Analyzing Longitudinal Magnetoresistance Asymmetry to Quantify Doping Gradients: Generalization of the van der Pauw Method.
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Zhou W
Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA.
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Yoo HM
Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA.
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Prabhu-Gaunkar S
Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA.
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Tiemann L
Laboratory for Solid State Physics, ETH Zürich, 8093 Zürich, Switzerland.
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Reichl C
Laboratory for Solid State Physics, ETH Zürich, 8093 Zürich, Switzerland.
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Wegscheider W
Laboratory for Solid State Physics, ETH Zürich, 8093 Zürich, Switzerland.
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Grayson M
Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA.
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Published in:
- Physical review letters. - 2015
English
A longitudinal magnetoresistance asymmetry (LMA) between a positive and negative magnetic field is known to occur in both the extreme quantum limit and the classical Drude limit in samples with a nonuniform doping density. By analyzing the current stream function in van der Pauw measurement geometry, it is shown that the electron density gradient can be quantitatively deduced from this LMA in the Drude regime. Results agree with gradients interpolated from local densities calibrated across an entire wafer, establishing a generalization of the van der Pauw method to quantify density gradients.
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hybrid
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https://sonar.ch/global/documents/267242
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