Journal article
Advanced thin film technology for ultrahigh resolution X-ray microscopy.
- Vila-Comamala J Paul Scherrer Institut, CH-5232 Villigen, Switzerland. joan.vila@psi.ch
- Jefimovs K
- Raabe J
- Pilvi T
- Fink RH
- Senoner M
- Maassdorf A
- Ritala M
- David C
- 2009-07-31
Published in:
- Ultramicroscopy. - 2009
English
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metal organic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.
- Language
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- English
- Open access status
- closed
- Identifiers
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- DOI 10.1016/j.ultramic.2009.07.005
- PMID 19640649
- Persistent URL
- https://sonar.ch/global/documents/278427
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