Metallic nanowires by full wafer stencil lithography.
- Vazquez-Mena O Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland. oscar.vazquez@epfl.ch
- Villanueva G
- Savu V
- Sidler K
- van den Boogaart MA
- Brugger J
- 2008-09-27
Published in:
- Nano letters. - 2008
English
Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for Al and 5 microOmegacm for Au and maximum current density of approximately 10(8) A/cm(2). This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.
- Language
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- English
- Open access status
- green
- Identifiers
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- DOI 10.1021/nl801778t
- PMID 18817451
- Persistent URL
- https://sonar.ch/global/documents/69604
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