Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure
- Nagahara, Seiji Tokyo Electron Ltd. (Japan)
- Carcasi, Michael Tokyo Electron America, Inc. (United States)
- Nakagawa, Hisashi JSR Corp. (Japan)
- Buitrago, Elizabeth Paul Scherrer Institute (Switzerland)
- Yildirim, Oktay ASML Netherlands B.V. (Netherlands)
- Shiraishi, Gosuke Tokyo Electron Kyushu Ltd. (Japan)
- Terashita, Yuichi Tokyo Electron Kyushu Ltd. (Japan)
- Minekawa, Yukie Tokyo Electron Kyushu Ltd. (Japan)
- Yoshihara, Kosuke Tokyo Electron Kyushu Ltd. (Japan)
- Tomono, Masaru Tokyo Electron Kyushu Ltd. (Japan)
- Mizoguchi, Hironori Tokyo Electron Kyushu Ltd. (Japan)
- Estrella, Joel Tokyo Electron America, Inc. (United States)
- Nagai, Tomoki JSR Corp. (Japan)
- Naruoka, Takehiko JSR Corp. (Japan)
- Dei, Satoshi JSR Micro N.V. (Belgium)
- Hori, Masafumi JSR Micro N.V. (Belgium)
- Oshima, Akihiro Osaka Univ. (Japan)
- Vockenhuber, Michaela Paul Scherrer Institute (Switzerland)
- Ekinci, Yasin Paul Scherrer Institute (Switzerland)
- Meeuwissen, Marieke ASML Netherlands B.V. (Netherlands)
- Verspaget, Coen ASML Netherlands B.V. (Netherlands)
- Hoefnagels, Rik ASML Netherlands B.V. (Netherlands)
- Rispens, Gijsbert ASML Netherlands B.V. (Netherlands)
- Maas, Raymond ASML Netherlands B.V. (Netherlands)
- Nakashima, Hideo Tokyo Electron Ltd. (Japan)
- Tagawa, Seiichi Osaka Univ. (Japan)
Published in:
- Extreme Ultraviolet (EUV) Lithography VII. - SPIE. - 2016
- Language
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- English
- Open access status
- green
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- Persistent URL
- https://sonar.ch/global/documents/93187
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